机械加工
计算
汽化
薄脆饼
材料科学
大气压等离子体
等离子体
大气压力
电极
Crystal(编程语言)
光学
电火花加工
石英
衍射
光电子学
分析化学(期刊)
复合材料
化学
冶金
物理
有机化学
海洋学
物理化学
量子力学
色谱法
计算机科学
程序设计语言
地质学
作者
Kazuya Yamamura,Yasuhisa Sano,Masafumi Shibahara,Kazuto Yamauchi,Hidekazu Mimura,Katsuyoshi Endo,Yuzo Mori
摘要
By the application of atmospheric pressure plasma, we have developed a new ultraprecision machining method named plasma chemical vaporization machining (CVM). In this method, several types of rotary or pipe electrodes are prepared for optimizing the required machining. In particular, by rotating the electrode in a high-pressure environment, both the supply of reactive species to the machining point and the exhaust of reaction products are effectively performed. In the case of fabricating a grazing-incidence total-reflection X-ray mirror, figuring accuracies of 3 nm (p–v) or less were achieved and a nearly diffraction-limited focusing performance was realized. As a result of the correction of the thickness distribution of the AT cut quartz crystal wafer, thickness uniformity was improved to a 10 nm level, and resonance property was also markedly improved without degradation by high-energy ion bombardment.
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