Janusz Nowak,R. P. Robertazzi,J. Z. Sun,G. Hu,Jeong-Heon Park,JungHyuk Lee,Anthony Annunziata,G. Lauer,Raman Kothandaraman,Eugene J. O Sullivan,P. L. Trouilloud,Younghyun Kim,D. C. Worledge
出处
期刊:IEEE Magnetics Letters [Institute of Electrical and Electronics Engineers] 日期:2016-01-01卷期号:7: 1-4被引量:124
标识
DOI:10.1109/lmag.2016.2539256
摘要
The dependence of the write-error rate (WER) on the applied write voltage, write pulse width, and device size was examined in individual devices of a spin-transfer torque (STT) magnetic random-access memory (MRAM) 4 kbit chip. We present 10 ns switching data at the 10 -6 error level for 655 devices, ranging in diameter from 50 nm to 11 nm, to make a statistically significant demonstration that a specific magnetic tunnel junction stack with perpendicular magnetic anisotropy is capable of delivering good write performance in junction diameters range from 50 to 11 nm. Furthermore, write-error-rate data on one 11 nm device down to an error rate of 7×10 -10 was demonstrated at 10 ns with a write current of 7.5 μA, corresponding to a record low switching energy below 100 fJ.