光掩模
不透明度
材料科学
千分尺
激光器
胶粘剂
光电子学
光学
平版印刷术
纳米技术
抵抗
物理
图层(电子)
作者
Shunji Kishida,Yoichi Yoshino
摘要
A laser based photolytic CVD Mask Repair System YL454A, capable of quickly and reliably repairing both clear and opaque defects, has been developed. For clear defect repairing, adhesive micrometer size chromium film of sharp-edged arbitrarily-sized rectangles, can be deposited in the opposite manner of conventional laser zapping process.
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