材料科学
收缩率
基质(水族馆)
衍射
辐照
栅栏
复合材料
光学
光电子学
海洋学
地质学
物理
核物理学
作者
Oleksandr Romanenko,Vasily Lavrentiev,Andrei Borodkin,V. Havránek,Anna Macková
标识
DOI:10.1016/j.nimb.2023.02.001
摘要
The present work focuses on the shrinkage of PMMA films under irradiation and its application to the creation of optical devices. We prepared the free-standing PMMA films in four different thicknesses (13, 21, 32, and 43 μm), and PMMA films of the same thickness, but deposited on a glass substrate. A diffraction grating was chosen as the optical device to show the applicability of the method. The study revealed that at a film thickness of 13–32 μm, the shrinkage of the free-standing film increases proportionally to its thickness, while the film on the substrate does not have a pronounced dependence. Films with the thickness of 43 µm do not follow this trend. It was found that under the same irradiation conditions, the film on the substrate shrinks more compared to the free-standing film. Interference patterns from the created diffraction gratings were shown to present spurious illumination areas.
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