Effects of Ni content on microstructure and fracture toughness of the ZrN/TiNiN nano-multilayer films

ZrN and TiNiN nanolayers are alternately deposited on silicon substrate by magnetron sputtering. A series of ZrN/TiNiN nano-multilayer films with different Ni contents are prepared by varying the Ni:Ti volume ratio of the targets. The effects of Ni content on the microstructure and mechanical properties of ZrN/TiNiN nano-multilayer films are studied by X-ray diffractometer (XRD), scanning electron microscopy (SEM), high resolution transmission electron microscopy (HRTEM) and nanoindentation instrument. The results show that with the increase of Ni content, the crystallization degree of ZrN phase first increases and then decreases. Besides, the hardness, elastic modulus and toughness of the films also increase first and then decrease with Ni content increasing. When Ni:Ti=1:24, the ZrN/TiNiN nano-multilayer films obtain the highest hardness, elastic modulus and fracture toughness, which are 23.2 GPa, 317.8 GPa and 2.29 MPa·m1/2, respectively. This is mainly attributed to the best columnar crystal growth of ZrN/TiNiN nano-multilayer film. The TiNiN layer changes into face centered cubic structure under the template of ZrN layer, and grows in coherent epitaxy with ZrN layer.