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50 积分 2022-05-12 加入
Reliability challenges in CMOS technology: A manufacturing process perspective
1天前
已完结
The Effect of Depth, AIR Gap Width and ION Implant on Deep Trench Isolation for BCD Technology
2天前
已完结
Structure and property changes of ZrO2/Al2O3/ZrO2 laminate induced by low-temperature NH3 annealing applicable to metal–insulator–metal capacitor
2年前
已完结
Development of New TiN/ZrO2/Al2O3/ZrO2/TiN Capacitors Extendable to 45nm Generation DRAMs Replacing HfO2 Based Dielectrics
2年前
已完结
High density metal-insulator-metal capacitor based on ZrO2∕Al2O3∕ZrO2 laminate dielectric
2年前
已完结
Dielectric Enhancement of Atomic Layer-Deposited Al2O3/ZrO2/Al2O3 MIM Capacitors by Microwave Annealing
2年前
已完结
Simulation of AC-DC step up and step down converter
2年前
已完结
Optimization of ALD grown Ni-, Co- and Fe-doped ZnO films
2年前
已完结
High-κ gate dielectrics: Current status and materials properties considerations
2年前
已完结
Physical and electrical characterization of polysilicon vs. TiN gate electrodes for HfO2 transistors
2年前
已完结
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