Lv5
1300 积分 2024-01-20 加入
Sputtering
21天前
已关闭
Evolution of Topography Under Low-Energy Ion Bombardment
22天前
已完结
Eliminating Polymer Flaking on a Passivation Etch Chamber using Carbon Polymer Coating Method
1个月前
已完结
A Study of Post Process Wafer-Less Chamber Clean Recipe in Lele Process
1个月前
已完结
Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate
2个月前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
3个月前
已完结
Erosion of focus rings in capacitively coupled plasma etching reactors
6个月前
已完结
A Particle Reduction Strategy for Plasma Etching Processes
6个月前
已完结
Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review
6个月前
已完结
Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma
6个月前
已完结
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