Lv11
70 积分 2025-01-11 加入
(Invited) Activation and Deactivation in Ultra-Highly Doped n-Type Epitaxy for nMOS Applications
3小时前
待确认
Low-Temperature Selective Si:As Epitaxy
4小时前
已完结
Advanced Arsenic Doped Epitaxial Growth for Source Drain Extension Formation in Scaled FinFET Devices
5小时前
已完结
Contact Resistivity of Highly Doped Si:P, Si:As, and Si:P:As Epi Layers for Source/Drain Epitaxy
5小时前
已完结
Comparing bulk-Si FinFET and gate-all-around FETs for the 5 nm technology node
5小时前
已完结
CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology
5小时前
已完结
Nanosheet-Based Transistor Architectures for Advanced CMOS Scaling: Wet Etch and Gas Phase Etch Challenges in Confined Spaces
16天前
已完结
Atomistic description of Si etching with HCl
1个月前
已完结
Kinetic Study for Plasma Assisted Cracking of NH3: Approaches and Challenges
2个月前
已完结
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