Lv13
60 积分 2024-10-25 加入
Study of ion implantation into EUV resist for LWR improvement
2天前
已完结
Extreme ultraviolet (EUV) lithography
4天前
已完结
Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography
10天前
已完结
Chemically amplified photoresists for 193‐nm photolithography: Effect of molecular structure and photonic parameters on photopatterning
21天前
已完结
High contact angle embedded barrier layer materials for next-generation 193 immersion lithography
23天前
已完结
Chemically amplified photoresists for 193‐nm photolithography: Effect of molecular structure and photonic parameters on photopatterning
23天前
已完结
Novel materials design for immersion lithography
24天前
已完结
Self-segregating materials for immersion lithography
24天前
已完结
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