Lv24
150 积分 2025-03-10 加入
Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study
7天前
已完结
Crystallinity and composition of Sc1−x(−y)Si x (P y ) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applications
7天前
已关闭
Low-resistivity molybdenum obtained by atomic layer deposition
8天前
已完结
Fundamentals of Modern VLSI Devices
20天前
已完结
Plasma Etch Variation Control in Double Patterning Based Metal Hard Mask Open Process
28天前
已关闭
The Process Challenge and Optimization of Self-Aligned Contact Etch
1个月前
已关闭
Plasma Etch Variation Control in Double Patterning Based Metal Hard Mask Open Process
1个月前
已完结
The Process Challenge and Optimization of Self-Aligned Contact Etch
1个月前
已完结
Potential CCP Pulsed Plasma Application at Beol AIO Etch Process
1个月前
已关闭
Via Bottom Profile Optimization in All-in-One Etch with Double Patterning Scheme
1个月前
已关闭
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