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10 积分 2024-05-07 加入
Inhomogeneities in PECVD deposited a-Si:H films induced by a spacing between substrate and substrate holder
8个月前
已完结
Self-isolating electrode deposition process using the area-selective MoO2 and MoO3 atomic layer deposition technique
8个月前
已完结
Enhanced thickness uniformity of large-scale α-Ga2O3 epilayers grown by vertical hot-wall mist chemical vapor deposition
8个月前
已完结
Effect of sputtering process parameters on the uniformity of copper film deposited in micro-via
8个月前
已完结
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2
8个月前
已完结
Effect of magnetic field on the thickness uniformity of thin film deposited on inner surface
8个月前
已完结
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