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Extreme UV self-aligned double patterning process optimization for BEOL interconnections on 3nm nodes and beyond
22小时前
求助中
Investigation of the influence of hardmask morphology on bowing effect in nano-scale silicon plasma etching process
22小时前
已完结
LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL)
1个月前
已完结
Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme
1个月前
已完结
Overview of atomic layer etching in the semiconductor industry
1个月前
已完结
A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas
2个月前
已完结
Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas
2个月前
已完结
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