Lv11
16 积分 2024-05-29 加入
Experimental characterization of model resist materials
7小时前
已完结
Modeling photon, electron, and chemical interactions in a model hafnium oxide nanocluster EUV photoresist
7小时前
已完结
Lithography mask thermal and stress effect for the machine overlay compensation
12天前
已完结
Impact of realistic source shape and flexibility on source mask optimization
12天前
已完结
Displacement talbot lithography: a new and versatile technology for printing periodic nanostructures (Conference Presentation)
14天前
已关闭
Modeling oblique incidence effects in photomasks
26天前
已完结
Efficient optical proximity correction based on semi-implicit additive operator splitting
29天前
已完结
Eliminate the vibration defect for laser interference lithography using an optical chopper system
1个月前
已完结
Clarifications on the 0.5 λ/NA resolution limit
1个月前
已完结
Influencing factors of self-aligned imaging in near-field lithography for the Fabry-Perot cavity effect
2个月前
已完结
Discovery of Dual Targeting GSK-3β/HIV-1 Reverse Transcriptase Inhibitors as Neuroprotective Antiviral Agents
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