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Atomic layer etching of GaN using Cl2 and He or Ar plasma
6小时前
待确认
Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas
6小时前
已完结
Effect of Plasma Modulation on Si Chemical DryEtching in F$_2$ Remote Plasmas
5个月前
已关闭
Three-dimensional modeling of microwave discharges in a waveguide-based plasma source with experimental comparison
5个月前
已完结
Modeling and Simulation of a Microwave-Assisted Plasma with Different Input Power for Plasma-Based Applications
5个月前
已完结
Comparison of models for silicon etching in CF4 + O2 plasma
5个月前
已完结
ON THE EFFECT OF OXYGEN ON PLASMA CHEMICAL KINETICS IN CF4 + O2 AND C4F8 + O2 GAS MIXTURES
6个月前
已关闭
Silicon VLSI Technology: Fundamentals, Practice and Modeling
7个月前
已完结
Encyclopedia of Inorganic Chemistry
8个月前
已关闭
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