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80 积分 2024-03-15 加入
Emission-line polarization degrees andnlmldistributions produced by state-selective electron capture in slow
1个月前
已完结
Noble gas effect on ACL etching selectivity to SiO2 films
1个月前
已完结
Atomic layer etching in HBr/He/Ar/O2 plasmas
1个月前
已完结
Atomic Layer Deposition and Atomic Layer Etching—An Overview of Selective Processes
1个月前
已关闭
Atomic layer etching of GaN using Cl2 and He or Ar plasma
1个月前
已完结
Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas
1个月前
已完结
Effect of Plasma Modulation on Si Chemical DryEtching in F$_2$ Remote Plasmas
7个月前
已关闭
Three-dimensional modeling of microwave discharges in a waveguide-based plasma source with experimental comparison
7个月前
已完结
Modeling and Simulation of a Microwave-Assisted Plasma with Different Input Power for Plasma-Based Applications
7个月前
已完结
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