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60 积分 2024-02-26 加入
Preparation of Cu-doped colloidal SiO2 abrasives and their chemical mechanical polishing behavior on sapphire substrates
2个月前
已完结
Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry
2个月前
已完结
Static Adsorption of an Ethoxylated Nonionic Surfactant on Carbonate Minerals
2个月前
已完结
Mechanism insights into Hg(II) adsorption on kaolinite(001) surface: A density functional study
3个月前
已完结
Effect of hydroxy carboxylates as complexing agent on improving chemical mechanical polishing performance of M-plane sapphire and action mechanism analysis
4个月前
已完结
Removal mechanism of 4H- and 6H-SiC substrates (0001 and 0001¯) in mechanical planarization machining
9个月前
已完结
Chemical reaction on silicon carbide wafer (0 0 0 1 and 0 0 0 −1) with water molecules in nanoscale polishing
10个月前
已完结
Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire
11个月前
已完结
Mechanism of the interaction between Al2O3 and SiO2 during the chemical-mechanical polishing of sapphire with silicon dioxide
11个月前
已完结
Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials
11个月前
已完结
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