Lv5
822 积分 2023-09-05 加入
Acid–base reactions in a positive tone chemically amplified photoresist and their effect on imaging
3天前
已完结
Relationship between Remaining Solvent and Acid Diffusion in Chemically Amplified Deep Ultraviolet Resists
3天前
已完结
Dissolution Kinetics and PAG Interaction of Phenolic Resins in Chemically Amplified Resists
3天前
已完结
Development of New Advanced Resist Materials for Microlithography
3天前
已关闭
Arylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups
3天前
已完结
Comparison of acid-generating efficiencies in 248 and 193-nm photoresists
3天前
已完结
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
3天前
已完结
Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method
3天前
已完结
Study of resolution limits due to intrinsic bias in chemically amplified photoresists
3天前
已完结
Direct Measurement of the Reaction Front in Chemically Amplified Photoresists
3天前
已完结
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