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70 积分 2024-07-18 加入
Electrical Characteristics of Silicon Nitride Films Prepared by Silane‐Ammonia Reaction
1小时前
待确认
Low-Hydrogen-Content Silicon Nitride Deposited at Room Temperature by Inductively Coupled Plasma Deposition
22天前
已完结
基于温和等离子体CVD的非晶硅薄膜的制备与钝化研究
28天前
已完结
Long-term stability of ICPCVD a-Si under prolonged heat treatment
1个月前
已完结
Determination of optimum deposition conditions amorphous silicon thin films
1个月前
已完结
基于温和等离子体CVD的非晶硅薄膜的制备与钝化研究
1个月前
已完结
氢化非晶硅叠层薄膜对单晶硅表面钝化研究
1个月前
已完结
ICPCVD低温生长非晶硅的工艺及光学特性研究
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已完结
Silicon and Silicon dioxide thin films deposited by ICPCVD at low temperature and high rate for MEMS applications
2个月前
已完结
The variations in composition and bonding configuration of SiNx film under high annealing temperature treatment
2个月前
已完结
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