X射线光电子能谱
热解
碳化
雷亚克夫
拉曼光谱
硅
材料科学
傅里叶变换红外光谱
化学工程
分子动力学
复合材料
分析化学(期刊)
化学
有机化学
计算化学
冶金
光学
扫描电子显微镜
工程类
物理
原子间势
作者
Youpei Du,Zhenhua Luo,Yang Yang,Yiming Yang,Wenjie Yuan,Hao Li,Yiqiang Hong,Zhen Dai,PingXia Zhang,Tong Zhao
出处
期刊:Carbon
[Elsevier]
日期:2022-08-11
卷期号:201: 504-519
被引量:23
标识
DOI:10.1016/j.carbon.2022.07.061
摘要
ReaxFF molecular dynamics (ReaxFF-MD) simulations and X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), Raman, Fourier transform infrared spectroscopy (FT-IR), 29Si NMR were used to investigate the temperature-dependent pyrolysis gas release behavior, dynamic evolution of microstructure, and fundamental carbonization mechanism of silicon-modified phenolic resin (SiPR). An improved and effective algorithm for model building was used to construct the cross-linked SiPR simulation model by considering three reactions in the actual experimental cross-linking process with adjustable occurrence rates. Tracking and analysis of the structures showed that with the continuous release of pyrolysis gas, the residual Si and C-containing components decomposed, rearranged, and aggregated into different phase structures. The Si-units agglomerated and underwent phase separation stages. The carbonization process was divided into three periods: initial aromatization, merging and flattening, and residual healing. These findings may shed light on the polysilicon phase distribution and carbonization mechanism of SiPR.
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