Lv3
240 积分 2020-05-12 加入
Influence of low temperature oxidation and nitrogen passivation on the MOS interface of C-face 4H-SiC
7个月前
已完结
Progress of Atomic Layer Deposition and Molecular Layer Deposition in the Development of All‐Solid‐State Lithium Batteries
8个月前
已完结
Initial Surface Reaction of Di-Isopropylaminosilane on a Fully Hydroxyl-Terminated Si (001) Surface
8个月前
已完结
The impact of deposition and annealing temperature on the growth properties and surface passivation of silicon dioxide films obtained by atomic layer deposition
9个月前
已关闭
ALD Mo for Advanced MOL Local Interconnects
9个月前
已完结
Electrical properties of Al2O3∕4H-SiC structures grown by atomic layer chemical vapor deposition
9个月前
已完结
Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
10个月前
已完结
Atomic layer deposition of silicon oxide films using bis(dimethylaminomethylsilyl)trimethylsilylamine and ozone: first-principles and experimental study
10个月前
已完结
Improvement in Al2O3 dielectric behavior by using ozone as an oxidant for the atomic layer deposition technique
10个月前
已完结
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