Lv2
166 积分 2024-11-14 加入
Modeling electromagnetic effects in capacitive discharges
18小时前
已完结
Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
22天前
已完结
Si Epitaxial Growth on the Atomic-Order Nitrided Si(100) Surface in SiH4 Reaction
2个月前
已关闭
Assessment of STI dry etch process variability by means of dynamic time warping technique
2个月前
已关闭
Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism
3个月前
已完结
Etching mechanism of amorphous hydrogenated silicon nitride by hydrogen fluoride
3个月前
已完结
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
3个月前
已完结
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas
4个月前
已完结
Investigation of the influence of hardmask morphology on bowing effect in nano-scale silicon plasma etching process
4个月前
已完结
Formation Mechanism of Rounded SiGe-Etch Front in Isotropic SiGe Plasma Etching for Gate-All-Around FETs
4个月前
已完结
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