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30 积分 2024-06-02 加入
Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists
1天前
已完结
Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography
3天前
已完结
Highly sensitive positive-working molecular resist based on new molecule
6天前
已完结
Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond
9天前
已完结
Integrated fab process for metal oxide EUV photoresist
10天前
已完结
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
11天前
已完结
Development of molecular resist derivatives for EUV lithography
13天前
已完结
Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography
13天前
已完结
On-wafer spectrofluorometric evaluation of the response of photoacid generator compounds in chemically amplified photoresists
18天前
已完结
Imaging dissolution rate monitor: Mapping the photoresist response
18天前
已完结
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